WHAT CHINWAGY KNOWS
The collaboration
is confirmed.
Samsung and ASML expanded their long-standing strategic partnership around High NA EUV lithography, 12-inch photomask technology and planned High NA EUV adoption for future DRAM high-volume manufacturing by 2028.
- Current status
- Official collaboration
- Known availability
- The official source confirms the collaboration; timing details remain under review.
- Place
- International, South Korea; Netherlands
- Source checked
- September 15, 2026
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